Přednášející
Martin Kolář
Popis
Titanium nitride is often used as a protective coating due to its hardness. Ionized jet deposition has a potential to improve and diversify ways of making TiN thin films. We optimised the nitrogen pressure in the IJD chamber to suppress concentration of titanium oxide in films. We manufactured a set of films using different deposition pressures. Based on the XRD data, higher gas pressure is preferable. In contrast, lower gas pressure contributes to higher film growth, based on AFM data.
